🤖 Dear ACM: You’re Using AI Wrong — But There’s Still Time to Fix It
A sharp, balanced essay highlighting the growing conflict between AI-driven automation and the preservation of human credibility in academic communication.
Computer scientist Anil Madhavapeddy criticizes the ACM Digital Library for placing AI-generated summaries behind a paywall. He argues that these summaries are often inaccurate and harm the credibility of peer-reviewed work. Instead, he urges ACM to use AI for improving open access, provenance tracking, and overall trust in scholarly publishing.
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⚙️ Partial Inlining: Smarter Compiler Optimization Explained
A precise and approachable explanation of an advanced compiler concept—ideal for developers seeking a deeper understanding of performance optimization.
Matt Godbolt explores ‘partial inlining,’ a compiler optimization technique that blends inlining performance gains with efficient code size management. By inlining the fast paths and outlining slower ones, compilers strike a balance between speed and binary bloat. The article includes practical assembly examples to illustrate these decisions in action.
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🧩 Mastering Bit Arrays in Gleam
A comprehensive and hands-on exploration of Gleam’s binary syntax — perfect for developers tackling protocol design or working with BEAM ecosystems.
This in-depth guide explains Gleam’s bit array syntax, derived from Erlang, enabling structured binary data construction and pattern matching. It details segment types, size and endianness options, and how Gleam manages floats, strings, and UTF codepoints. The author also demonstrates encoding and decoding Minecraft’s NBT format while noting limitations of JavaScript targets.
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🧠 GPT-5.2-Codex
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⚡ Inside China’s ‘Manhattan Project’ for AI Chips
A potentially game-changing milestone in global semiconductor competition — if confirmed, it could reshape the balance of AI hardware power.
Engineers in Shenzhen have reportedly built a prototype capable of producing next-generation AI and military-grade chips, despite U.S. sanctions. Developed by former ASML engineers through reverse-engineering of EUV lithography systems, the project marks a major step in China’s semiconductor independence push.
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